Superiority of N2O plasma annealing over O2 plasma annealing for amorphous tantalum pentoxide (Ta2O5) films

被引：0
|
作者：
Lau, Wai Shing [1 ]
Perera, Merinnage Tamara Chandima [1 ]
Babu, Premila [1 ]
Ow, Aik Keong [1 ]
Han, Taejoon [1 ]
Sandler, Nathan P. [1 ]
Tung, Chih Hang [1 ]
Sheng, Tan Tsu [1 ]
Chu, Paul K. [1 ]
机构：
[1] Natl Univ of Singapore, Singapore, Singapore
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1998年 / 37卷 / 4 B期
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D O I：
10.1143/jjap.37.l435
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