Role of He gas mixture on the growth of anatase and rutile TiO2 films in RF magnetron sputtering

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作者：
Okimura, Kunio [1 ]
Shibata, Akira [1 ]
机构：
[1] Fukui Natl Coll of Technology, Fukui, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 5 A期
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页码：2849 / 2855
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