Role of He gas mixture on the growth of anatase and rutile TiO2 films in RF magnetron sputtering

被引：0
|
作者：
Okimura, Kunio [1 ]
Shibata, Akira [1 ]
机构：
[1] Fukui Natl Coll of Technology, Fukui, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 5 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：2849 / 2855
相关论文
共 50 条
  • [1] Role of He gas mixture on the growth of anatase and rutile TiO2 films in RF magnetron sputtering
    Okimura, K
    Shibata, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (5A): : 2849 - 2855
  • [2] Simultaneous epitaxial growth of anatase and rutile TiO2 thin films by RF helicon magnetron sputtering
    Miao, L
    Tanemura, S
    Jin, P
    Kaneko, K
    Terai, A
    Nabatova-Gabain, N
    JOURNAL OF CRYSTAL GROWTH, 2003, 254 (1-2) : 100 - 106
  • [3] Preparation and characterization of polycrystalline anatase and rutile TiO2 thin films by rf magnetron sputtering
    Miao, L
    Jin, P
    Kaneko, K
    Terai, A
    Nabatova-Gabain, N
    Tanemura, S
    APPLIED SURFACE SCIENCE, 2003, 212 : 255 - 263
  • [4] PREPARATION OF RUTILE TIO2 FILMS BY RF MAGNETRON SPUTTERING
    OKIMURA, K
    SHIBATA, A
    MAEDA, N
    TACHIBANA, K
    NOGUCHI, Y
    TSUCHIDA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9A): : 4950 - 4955
  • [5] Optical properties of polycrystalline and epitaxial anatase and rutile TiO2 thin films by rf magnetron sputtering
    Tanemura, S
    Miao, L
    Jin, P
    Kaneko, K
    Terai, A
    Nabatova-Gabain, N
    APPLIED SURFACE SCIENCE, 2003, 212 : 654 - 660
  • [6] Low temperature growth of rutile TiO2 films in modified rf magnetron sputtering
    Okimura, K
    SURFACE & COATINGS TECHNOLOGY, 2001, 135 (2-3): : 286 - 290
  • [7] Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering
    Rafieian, Damon
    Ogieglo, Wojciech
    Savenije, Tom
    Lammertink, Rob G. H.
    AIP ADVANCES, 2015, 5 (09)
  • [8] Characteristics of rutile TiO2 films prepared by rf magnetron sputtering at a low temperature
    Okimura, K
    Maeda, N
    Shibata, A
    THIN SOLID FILMS, 1996, 281 : 427 - 430
  • [9] Optical properties of anatase, rutile and amorphous phases of TiO2 thin films grown at room temperature by RF magnetron sputtering
    Naik, VM
    Haddad, D
    Naik, R
    Benci, J
    Auner, GW
    SOLID-STATE CHEMISTRY OF INORGANIC MATERIALS IV, 2003, 755 : 413 - 418
  • [10] Photocarrier dynamic measurement of rutile TiO2 films prepared by RF magnetron reactive sputtering
    Wan, Guangmiao
    Wang, Shenwei
    Li, Ling
    Mu, Guangyao
    Yin, Xue
    Zhang, Xinwu
    Tang, Ying
    Yi, Lixin
    JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 701 : 549 - 553
12345