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- [43] Study of the electroluminescence at 1.5 μm of SiOx:Er layers made by reactive magnetron sputtering. PROCEEDINGS OF THE 2009 SPANISH CONFERENCE ON ELECTRON DEVICES, 2009, : 69 - +
- [44] CHARACTERISTICS OF A-Si FILMS PREPARED BY COMPRESSED MAGNETIC FIELD (CMF)-MAGNETRON SPUTTERING. Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), 1988, 71 (02): : 9 - 18
- [46] Study of an argon magnetron discharge used for molybdenum sputtering. I: collisional radiative model PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (03): : 127 - 137
- [47] ATTEMPT TO FORM ULTRAFINE PARTICLES BY SPUTTERING. Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy, 1987, 34 (07): : 314 - 317
- [48] Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering. TEXTURE AND ANISOTROPY OF POLYCRYSTALS II, 2005, 105 : 447 - 452
- [49] PROPERTIES OF HYDROGENATED AND FLUORINATED AMORPHOUS SILICON-CARBON ALLOY FILMS PREPARED BY MAGNETRON SPUTTERING. Philosophical Magazine B: Physics of Condensed Matter; Electronic, Optical and Magnetic Properties, 1987, 55 (05): : 615 - 625