Characterization of Ni55.6Mn11.4Fe7.4Ga25.6 high temperature shape memory alloy thin film

被引：0
|
作者：
Wang, H.B. [1 ]
Liu, C. [1 ]
Lei, Y.C. [1 ]
Cai, W. [1 ]
机构：
[1] National Key Laboratory Precision Hot Processing of Metals, Harbin Institute of Technology, Harbin, 150001, China
来源：
Journal of Alloys and Compounds | 2008年 / 465卷 / 1-2期
关键词：
The Ni55.6Mn11.4Fe7.4Ga25.6 high temperature shape memory alloy thin film was deposited onto silicon substrates by using radio-frequency (R.F.) magnetron sputtering technique. Surface morphology; crystallographic structure; martensitic transformation and microstructure were systematically investigated by means of scanning electron microscopy (SEM); atomic force microscope (AFM); X-ray diffraction (XRD); differential scanning calorimetry (DSC) and transmission electron microscopy (TEM). The results show that the film has columnar structure and an excellent surface quality. The film has seven-layered modulated orthorhombic structure with typical self-accommodated morphology at room temperature. The martensitic transformation start temperature of the film is up to 439 K; much higher than room temperature; displaying the promising application as high temperature actuator material. © 2007 Elsevier B.V. All rights reserved;
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页码：458 / 461
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