Scaling behavior of internal stress in electrodeposited nickel thin films

被引：0

作者：

Saitou, M. ^{[1
]}

Oshiro, S. ^{[1
]}

Sagawa, Y. ^{[1
]}

机构：

[1] Department of Mechanical Systems Engineering, University of the Ryukyus, 1 Senbaru Nishihara-cho, Okinawa, 903-0213, Japan

来源：

Journal of Applied Physics | 2008年 / 104卷 / 09期

关键词：

We have investigated the effects of the current density; film thickness; temperature; and additive agent on the internal stress in electrodeposited nickel thin films using a bent strip measurement. The internal stress is found to obey a scaling law expressed in terms of the current density and film thickness. The additive agent is shown to behave as a noise leading to different exponents in the dynamic scaling theory. In addition; the Arrhenius temperature dependence of the internal stress indicates the presence of thermal activation related to grain growth. © 2008 American Institute of Physics;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

共 50 条

[41] PHYS 324-Characterization of electrodeposited nickel, iron, and nickel-iron thin films
Boman, Timothy S.
Ouma, M. John
Hampton, Jennifer R.
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2009, 237
[42] The finite-size scaling in thin ferromagnetic nickel films
Hong, S
Rhee, I
IEEE TRANSACTIONS ON MAGNETICS, 1999, 35 (05) : 3064 - 3066
[43] Internal stress in sputtered silver nickel thin films and multilayers:: Sputtering pressure and thickness effects
Gergaud, P
Yang, H
Pélissonnier-Grosjean, C
Bottger, AJ
Sandström, P
Sundgren, JE
Thomas, O
POLYCRYSTALLINE METAL AND MAGNETIC THIN FILMS, 1999, 562 : 123 - 128
[44] Anomalous scaling for thick electrodeposited films
Lafouresse, M. C.
Heard, P. J.
Schwarzacher, W.
PHYSICAL REVIEW LETTERS, 2007, 98 (23)
[45] STRESS REDUCTION OF ELECTRODEPOSITED NICKEL
MARCHESE, VJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1952, 99 (02) : 39 - 43
[46] Analysis and computation of the internal stress in thin films
Cheng, KJ
Cheng, SY
PROGRESS IN NATURAL SCIENCE, 1998, 8 (06) : 679 - 689
[47] MEASUREMENT OF INTERNAL STRESS IN THIN-FILMS
PAESLER, MA
FRITZSCHE, H
REVIEW OF SCIENTIFIC INSTRUMENTS, 1974, 45 (01): : 114 - 115
[48] INTERNAL STRESS OF EVAPORATED THIN GOLD FILMS
KINBARA, A
HARAKI, H
JAPANESE JOURNAL OF APPLIED PHYSICS, 1965, 4 (04) : 243 - +
[49] Internal stress in ferrite plated thin films
Kitamoto, Y.
Abe, M.
Journal De Physique. IV : JP, 1997, 7 (01): : 595 - 596
[50] Analysis and computation of the internal stress in thin films
程开甲
程漱玉
Progress in Natural Science, 1998, (06) : 40 - 50

← 1 2 3 4 5 →