Conformal deposition of manganese oxide thin films on carbon nanowalls by remote plasma atomic layer deposition process

This paper reports a novel process for the conformal coating of MnOx on Carbon nanowalls (CNWs) by remote plasma atomic layer deposition (remote plasma ALD), effectively taking over the disconformity issue encountered in the conventional deposition processes. Mn(thd)3 was utilized as a manganese source, and O2 remote plasma was applied as an oxygenation gas to cover CNWs with MnOx thin film at 186 degrees C conformally. Conformity analysis of the deposited MnOx thin film and characterization of the CNWs/MnOx nanocomposite were carried out using scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), backscattering electrons (BSE) scanning microscopy and X-ray photoelectron spectroscopy (XPS). Conformal deposition was successfully achieved on the vertically aligned CNWs nanostructures with a growth rate of approximately 5 p.m. per cycle without appreciable incubation time. This study revealed an appreciable method for conformal deposition of MnOx on CNW as a potential electrode for energy storage/conversion devices.