Mechanism of field emission from a highly phosphorous-doped chemical vapor deposition diamond (111) surface

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Kono, Shozo [1 ,2 ]
Takyo, Go [1 ]
Amano, Naoki [1 ]
Plusnin, Nickolay I. [1 ,4 ]
Mizuochi, Kenji [1 ]
Aoyama, Tomohiro [1 ,5 ]
Goto, Tadahiko [1 ]
Abukawa, Tadashi [1 ]
Namba, Akihiko [3 ]
Tasumi, Natsuo [3 ]
Nishibayashi, Yoshiki [3 ]
Imai, Takahiro [3 ]
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[1] IMRAM, Tohoku University, Sendai 980-8577, Japan
[2] CREST, JST, Tokyo 150-0011, Japan
[3] Sumitomo Electric Industries, Ltd., Itami, Hyogo 664-0016, Japan
[4] IACP, Far Eastern Branch, Russian Academy of Science, Vladivostok 690041, Russia
[5] Steel Research Laboratory, JFE Steel Corporation, Kawasaki 210-0855, Japan
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The mechanism of field emission from a highly P-doped diamond (111) surface has been studied by field/photo emission electron micro-spectroscopy. It was found that field emission peaks were located at -3 to -6 eV with respect to the substrate Fermi level (EF) and that photoemission peaks were located at -1 to +2 eV with respect to the substrate EF. Comparing this with the knowledge of work function and electron affinity of the sample; the mechanism of field emission has been elucidated. Namely; field emitted electrons are tunnel-emitted from states around the surface Ep and there is a large amount of resistive potential drop at the emission site. © 2007 The Japan Society of Applied Physics;
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