Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy

被引：0
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作者：
Xu, Y.W. [1 ]
Wang, H.M. [1 ]
机构：
[1] Laboratory of Laser Materials Processing and Manufacturing, School of Materials Science and Engineering, BeiHang University, 37 Xueyuan Road, Beijing, 100083, China
来源：
Journal of Alloys and Compounds | 2008年 / 457卷 / 1-2期
关键词：
The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While; the cracks existing in the oxide scale due to growth stress; thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance. © 2007 Elsevier B.V. All rights reserved;
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页码：239 / 243
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