首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
Improvement of thermal stability of amorphous CoFeSiB thin films
被引:0
|
作者
:
机构
:
[1]
Jimbo, M.
[2]
Fujiwara, Y.
[3]
Shimizu, T.
来源
:
Jimbo, M. (jimbo@daido-it.ac.jp)
|
1600年
/ American Institute of Physics Inc.卷
/ 117期
关键词
:
Thermodynamic stability;
D O I
:
暂无
中图分类号
:
学科分类号
:
摘要
:
引用
收藏
相关论文
共 50 条
[31]
Thermal Characterization of SiC Amorphous Thin Films
Taehee Jeong
论文数:
0
引用数:
0
h-index:
0
机构:
Carnegie Mellon University,Department of Electrical and Computer Engineering
Taehee Jeong
Jian-Gang Zhu
论文数:
0
引用数:
0
h-index:
0
机构:
Carnegie Mellon University,Department of Electrical and Computer Engineering
Jian-Gang Zhu
Sining Mao
论文数:
0
引用数:
0
h-index:
0
机构:
Carnegie Mellon University,Department of Electrical and Computer Engineering
Sining Mao
Tao Pan
论文数:
0
引用数:
0
h-index:
0
机构:
Carnegie Mellon University,Department of Electrical and Computer Engineering
Tao Pan
Yun Jun Tang
论文数:
0
引用数:
0
h-index:
0
机构:
Carnegie Mellon University,Department of Electrical and Computer Engineering
Yun Jun Tang
International Journal of Thermophysics,
2012,
33
: 1000
-
1012
[32]
Thermal conductivity of amorphous silicon thin films
Moon, S
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
Moon, S
Hatano, M
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
Hatano, M
Lee, MH
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
Lee, MH
Grigoropoulos, CP
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
Grigoropoulos, CP
INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER,
2002,
45
(12)
: 2439
-
2447
[33]
Thermal stability of nitride thin films
Hultman, L
论文数:
0
引用数:
0
h-index:
0
机构:
Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden
Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden
Hultman, L
VACUUM,
2000,
57
(01)
: 1
-
30
[34]
Thermal stability of crystalline thin films
Jiang, Q
论文数:
0
引用数:
0
h-index:
0
机构:
Jilin Univ Technol, Dept Mat Sci & Engn, Changchun 130025, Peoples R China
Jilin Univ Technol, Dept Mat Sci & Engn, Changchun 130025, Peoples R China
Jiang, Q
Tong, HY
论文数:
0
引用数:
0
h-index:
0
机构:
Jilin Univ Technol, Dept Mat Sci & Engn, Changchun 130025, Peoples R China
Tong, HY
Hsu, DT
论文数:
0
引用数:
0
h-index:
0
机构:
Jilin Univ Technol, Dept Mat Sci & Engn, Changchun 130025, Peoples R China
Hsu, DT
Okuyama, K
论文数:
0
引用数:
0
h-index:
0
机构:
Jilin Univ Technol, Dept Mat Sci & Engn, Changchun 130025, Peoples R China
Okuyama, K
Shi, FG
论文数:
0
引用数:
0
h-index:
0
机构:
Jilin Univ Technol, Dept Mat Sci & Engn, Changchun 130025, Peoples R China
Shi, FG
THIN SOLID FILMS,
1998,
312
(1-2)
: 357
-
361
[35]
Combinatorial design of amorphous TaNiSiC thin films with enhanced hardness, thermal stability, and corrosion resistance
Kaplan, Maciej
论文数:
0
引用数:
0
h-index:
0
机构:
Uppsala Univ, Dept Phys & Astron, Mat Phys, Uppsala, Sweden
Uppsala Univ, Dept Phys & Astron, Mat Phys, Uppsala, Sweden
Kaplan, Maciej
论文数:
引用数:
h-index:
机构:
Srinath, Aishwarya
Riekehr, Lars
论文数:
0
引用数:
0
h-index:
0
机构:
Uppsala Univ, Dept Chem, Angstrom Lab, Uppsala, Sweden
Uppsala Univ, Dept Phys & Astron, Mat Phys, Uppsala, Sweden
Riekehr, Lars
论文数:
引用数:
h-index:
机构:
Nyholm, Leif
Hjorvarsson, Bjorgvin
论文数:
0
引用数:
0
h-index:
0
机构:
Uppsala Univ, Dept Phys & Astron, Mat Phys, Uppsala, Sweden
Uppsala Univ, Dept Phys & Astron, Mat Phys, Uppsala, Sweden
Hjorvarsson, Bjorgvin
论文数:
引用数:
h-index:
机构:
Fritze, Stefan
MATERIALS & DESIGN,
2022,
220
[36]
Thermal stability of amorphous Ti3Si1O8 thin films
Giauque, PH
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH, Pasadena, CA 91125 USA
CALTECH, Pasadena, CA 91125 USA
Giauque, PH
Cherry, HB
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH, Pasadena, CA 91125 USA
Cherry, HB
Nicolet, MA
论文数:
0
引用数:
0
h-index:
0
机构:
CALTECH, Pasadena, CA 91125 USA
Nicolet, MA
MICROELECTRONIC ENGINEERING,
2001,
55
(1-4)
: 183
-
188
[37]
SUPERCONDUCTING CHARACTERISTICS AND THE THERMAL-STABILITY OF TUNGSTEN-BASED AMORPHOUS THIN-FILMS
KONDO, S
论文数:
0
引用数:
0
h-index:
0
机构:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama., Saitama
KONDO, S
JOURNAL OF MATERIALS RESEARCH,
1992,
7
(04)
: 853
-
860
[38]
Thermal Stability and Phase Transformations of γ-/Amorphous-Al2O3 Thin Films
论文数:
引用数:
h-index:
机构:
Eklund, Per
Sridharan, Madanagurusamy
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Aarhus, Dept Phys & Astron, DK-8000 Aarhus C, Denmark
Univ Aarhus, Dept Phys & Astron, DK-8000 Aarhus C, Denmark
Sridharan, Madanagurusamy
Singh, Gurvinder
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Aarhus, Dept Phys & Astron, DK-8000 Aarhus C, Denmark
Univ Aarhus, Dept Phys & Astron, DK-8000 Aarhus C, Denmark
Singh, Gurvinder
Bottiger, Jorgen
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Aarhus, Dept Phys & Astron, DK-8000 Aarhus C, Denmark
Univ Aarhus, Dept Phys & Astron, DK-8000 Aarhus C, Denmark
Bottiger, Jorgen
PLASMA PROCESSES AND POLYMERS,
2009,
6
: S907
-
S911
[39]
Effect of hydrogen on stability of amorphous silicon thin films
Pietruszko, SM
论文数:
0
引用数:
0
h-index:
0
机构:
Warsaw Univ Technol, IMiO PW, Inst Microelect & Optoelect, PL-00662 Warsaw, Poland
Pietruszko, SM
Jang, J
论文数:
0
引用数:
0
h-index:
0
机构:
Warsaw Univ Technol, IMiO PW, Inst Microelect & Optoelect, PL-00662 Warsaw, Poland
Jang, J
SOLAR ENERGY MATERIALS AND SOLAR CELLS,
2002,
71
(04)
: 459
-
464
[40]
THERMAL-CONDUCTIVITY OF THIN AMORPHOUS ALUMINA FILMS
STARK, I
论文数:
0
引用数:
0
h-index:
0
机构:
MARTIN LUTHER UNIV,FACHBEREICH PHYS,BACH PL 6,O-4020 HALLE,GERMANY
MARTIN LUTHER UNIV,FACHBEREICH PHYS,BACH PL 6,O-4020 HALLE,GERMANY
STARK, I
STORDEUR, M
论文数:
0
引用数:
0
h-index:
0
机构:
MARTIN LUTHER UNIV,FACHBEREICH PHYS,BACH PL 6,O-4020 HALLE,GERMANY
MARTIN LUTHER UNIV,FACHBEREICH PHYS,BACH PL 6,O-4020 HALLE,GERMANY
STORDEUR, M
SYROWATKA, F
论文数:
0
引用数:
0
h-index:
0
机构:
MARTIN LUTHER UNIV,FACHBEREICH PHYS,BACH PL 6,O-4020 HALLE,GERMANY
MARTIN LUTHER UNIV,FACHBEREICH PHYS,BACH PL 6,O-4020 HALLE,GERMANY
SYROWATKA, F
THIN SOLID FILMS,
1993,
226
(01)
: 185
-
190
←
1
2
3
4
5
→