Interface-induced phenomena in polarization response of ferroelectric thin films

被引：0
|
作者：
Tagantsev, A.K. [1 ]
Gerra, G. [1 ]
机构：
[1] Ceramics Laboratory, Swiss Federal Institute of Technology (EPFL), CH-1015 Lausanne, Switzerland
来源：
Journal of Applied Physics | 2006年 / 100卷 / 05期
关键词：
Ferroelectric thin films;
D O I：
暂无
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摘要：
Journal article (JA)
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