Interface-induced phenomena in polarization response of ferroelectric thin films

被引:0
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作者
Tagantsev, A.K. [1 ]
Gerra, G. [1 ]
机构
[1] Ceramics Laboratory, Swiss Federal Institute of Technology (EPFL), CH-1015 Lausanne, Switzerland
来源
Journal of Applied Physics | 2006年 / 100卷 / 05期
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Ferroelectric thin films;
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