Subnanometer surface roughness of dc magnetron sputtered Al films

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作者：
Rode, D.L. [1 ]
Gaddam, V.R. [1 ]
Yi, Ji Haeng [1 ]
机构：
[1] Department of Electrical and Systems Engineering, Washington University, St. Louis, MO 63130, United States
来源：
Journal of Applied Physics | 2007年 / 102卷 / 02期
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