Technology for monitoring the surface emission inhomogeneity in plasma electronics devices

被引:0
|
作者
Mustafaev, A. S. [1 ]
Grabovskiy, A. Y. [1 ]
Sukhomlinov, V. S. [2 ]
Shtoda, E. V. [1 ]
机构
[1] Empress Catherine II St Petersburg Min Univ, Dept Gen & Tech Phys, St Petersburg 199406, Russia
[2] St Petersburg State Univ, Dept Opt, St Petersburg 19903, Russia
关键词
REFLECTION; CRYSTALS;
D O I
10.1063/5.0233459
中图分类号
O59 [应用物理学];
学科分类号
摘要
The article discusses a theoretical and experimental investigation of the reflection of slow electrons from the surfaces of single-crystal and polycrystalline tungsten thermionic cathodes. The findings challenge traditional ideas as they confirm that the effective reflection coefficient, r(eff), can reach values close to unity contrary to prior belief. The reason for this occurrence has been established, which is the additional reflection of slow electrons from a potential barrier near polycrystalline surfaces. A method has been developed to separately measure electron reflection coefficients at the surfaces of thermionic cathodes and at the potential barrier of electrode spot fields with different work functions. The study reveals that the maximum values of r(eff) are achieved on polycrystalline surfaces. Additionally, the work functions and reflection coefficients r(hkl) have been determined for the faces of single crystals of (110), (112), (100), (111), and (116) oriented tungsten. The proposed method enables control over cathode emission inhomogeneity and makes it possible to mitigate the negative effects of secondary electron emission by suppressing electric fields near the cathode surface. (c) 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial 4.0 International (CC BY-NC) license (https://creativecommons.org/licenses/by-nc/4.0/).
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页数:11
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