Thickness dependence of intrinsic dielectric response and apparent interfacial capacitance in ferroelectric thin films

被引：0

作者：

Pertsev, N.A. ^{[1
,4
]}

Dittmann, R. ^{[1
]}

Plonka, R. ^{[2
]}

Waser, R. ^{[2
,3
]}

机构：

[1] Institut für Festkörperforschung, CNI, Forschungszentrum Jülich, D-52425 Jülich, Germany

[2] Institut für Werkstoffe der Elektrotechnik, RWTH Aachen University, D-52056 Aachen, Germany

[3] Institut für Festkörperforschung, CNI, Forschungszentrum Jülich, D-52425 Jülich

[4] A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia

来源：

Journal of Applied Physics | 2007年 / 101卷 / 07期

关键词：

Ferroelectric thin films;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

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