Thickness dependence of intrinsic dielectric response and apparent interfacial capacitance in ferroelectric thin films

被引：0
|
作者：
Pertsev, N.A. [1 ,4 ]
Dittmann, R. [1 ]
Plonka, R. [2 ]
Waser, R. [2 ,3 ]
机构：
[1] Institut für Festkörperforschung, CNI, Forschungszentrum Jülich, D-52425 Jülich, Germany
[2] Institut für Werkstoffe der Elektrotechnik, RWTH Aachen University, D-52056 Aachen, Germany
[3] Institut für Festkörperforschung, CNI, Forschungszentrum Jülich, D-52425 Jülich
[4] A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia
来源：
Journal of Applied Physics | 2007年 / 101卷 / 07期
关键词：
Ferroelectric thin films;
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摘要：
Journal article (JA)
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