Influence of Al content on microstructure and oxidation resistance of (V, W, Al)N composite films

被引：0
|
作者：
Yu, Li-Hua [1 ]
Wang, Jie [1 ]
Xu, Jun-Hua [1 ]
机构：
[1] School of Materials Science and Engineering, Jiangsu University of Science and Technology, Key Laboratory of Advanced Welding Technology, Zhenjiang , China
来源：
Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment | 2014年 / 35卷 / 10期
关键词：
Aluminum nitride - X ray diffraction - Microstructure - Nitrogen compounds - Composite films - Aluminum - Magnetron sputtering - Crystal structure - III-V semiconductors;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：172 / 177
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