Study of low temperature deposition of magnetic sputtering TiN films and their tribological properties

被引：0
|
作者：
Reliability Engineering Institute, Wuhan University of Technology, Wuhan 430063, China [1 ]
不详 [2 ]
机构：
来源：
Run Hua Yu Mi Feng | 2006年 / 5卷 / 15-17+21期
关键词：
5;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Effect of sputtering pressure and annealing temperature on the properties of indium tin oxide thin films
    Gheidari, A. Mohammadi
    Behafarid, F.
    Kavei, G.
    Kazemad, M.
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 136 (01): : 37 - 40
  • [42] LOW-PRESSURE AND TEMPERATURE DEPOSITION OF TRANSPARENT CONDUCTIVE INDIUM TIN OXIDE (ITO) FILMS BY THE FACE TARGET SPUTTERING (FTS) PROCESS
    LEE, WK
    MACHINO, T
    SUGIHARA, T
    THIN SOLID FILMS, 1993, 224 (01) : 105 - 111
  • [43] Tribological and mechanical behaviors of TiN/CNx multilayer films deposited by magnetron sputtering
    Liu, D. G.
    Tu, J. P.
    Gu, C. D.
    Chen, R.
    Hong, C. F.
    THIN SOLID FILMS, 2011, 519 (15) : 4842 - 4848
  • [44] Reactive magnetron sputtering deposition of TiN films .1. Influence of the substrate temperature on structure, composition and morphology of the films
    Combadiere, L
    Machet, J
    SURFACE & COATINGS TECHNOLOGY, 1997, 88 (1-3): : 17 - 27
  • [45] Low temperature deposition of indium tin oxide (ITO) films on plastic substrates
    Singh, V
    Saswat, B
    Kumar, S
    Materials, Integration and Technology for Monolithic Instruments, 2005, 869 : 139 - 144
  • [46] Low temperature deposition and crystallization of large-grained Ge films on TiN
    Herner, SB
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2006, 9 (05) : G161 - G163
  • [47] Evaluation of the Mechanical and Tribological Properties of Multilayer CrN/TiN Films Deposited at Low Temperatures
    Kolaklieva, L.
    Rabadzhiyska, S.
    Kakanakov, R.
    Chitanov, V.
    Cholakova, T.
    Rupetchov, V.
    Mishev, G.
    2017 IEEE 30TH INTERNATIONAL CONFERENCE ON MICROELECTRONICS (MIEL), 2017, : 187 - 190
  • [48] LOW-TEMPERATURE BEAM-INDUCED DEPOSITION OF THIN TIN FILMS
    FUNSTEN, HO
    BORING, JW
    JOHNSON, RE
    BROWN, WL
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (03) : 1475 - 1484
  • [49] Dependence of tribological properties on deposition parameters for non hydrogenated amorphous carbon films produced by magnetron sputtering
    Mounier, E
    Juliet, P
    Quesnel, E
    Pauleau, Y
    SURFACE & COATINGS TECHNOLOGY, 1995, 76-77 (1-3): : 548 - 552
  • [50] Deposition of hard thin films and their tribological properties
    Tanaka, A
    JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS, 2001, 46 (07) : 558 - 563
12345