Nanoindentation investigation of amorphous hydrogenated carbon thin films deposited by ECR-MPCVD

被引：0
|
作者：
Jian S.-R. [1 ]
Fang T.-H. [2 ]
Chuu D.-S. [1 ]
机构：
[1] Institute and Department of Electrophysics, National Chiao Tung University
[2] Department of Mechanical Engineering, Southern Taiwan University of Technology
来源：
Journal of Non-Crystalline Solids | 2010年 / 356卷 / 43期
关键词：
D O I：
10.1016/j.jnoncrysol.2003.10.012
中图分类号：
学科分类号：
摘要：
Nanomechanical properties of amorphous hydrogenated carbon thin films are performed by nanoindentation technique. The amorphous hydrogenated carbon films are produced on silicon substrate by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD). The effect of negative bias voltage on amorphous hydrogenated carbon films is examined by Raman spectroscopy and the results showed that the intensity ratio of D-peak to G-peak (I D/IG) of amorphous hydrogenated carbon films at various bias voltages, increased as the bias voltage increased. The results also showed that Young's modulus and hardness also increased as the bias voltage increased. In addition, Young's modulus and hardness both decreased as the indentation depth increased. © 2003 Elsevier B.V. All rights reserved.
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页码：291 / 295
页数：4
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