Enhanced mass transport in ultrarapidly heated Ni/Si thin-film multilayers

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作者
Cook, L.P. [1 ,2 ]
Cavicchi, R.E. [1 ]
Bassim, N. [1 ,3 ]
Eustis, S. [1 ,4 ]
Wong-Ng, W. [1 ]
Levin, I. [1 ]
Kattner, U.R. [1 ]
Campbell, C.E. [1 ]
Montgomery, C.B. [1 ]
Egelhoff, W.F. [1 ]
Vaudin, M.D. [1 ]
机构
[1] National Institute of Standards and Technology, Gaithersburg, MD 20899, United States
[2] PhazePro Technologies, LLC, Hustontown, PA 17229, United States
[3] Naval Research Laboratory, Washington, DC 20375, United States
[4] Directed Vapor Technologies International, Inc., Charlottesville, VA 22903, United States
来源
Journal of Applied Physics | 2009年 / 106卷 / 10期
关键词
We investigated multilayer and bilayer Ni/Si thin films by nanodifferential scanning calorimetry (nano-DSC) at ultrarapid scan rates; in a temperature-time regime not accessible with conventional apparatus. DSC experiments were completed at slower scan rates as well; where it was possible to conduct parallel rapid thermal annealing experiments for comparison. Postexperimental characterization was accomplished by x-ray diffraction; and by transmission electron microscopy (TEM) and energy-filtered TEM of thin cross sections prepared by focused ion beam milling. We found that rate of heating has a profound effect on the resulting microstructure; as well as on the DSC signal. After heating to 560 °C at 120 °C/s; the general microstructure of the multilayer was preserved; in spite of extensive interdiffusion of Ni and Si. By contrast; after heating to 560 °C at 16000 ° C/s; the multilayer films were completely homogeneous with no evidence of the original multilayer microstructure. For the slower scan rates; we interpret the results as indicating a solid state diffusion-nucleation-growth process. At the higher scan rates; we suggest that the temperature increased so rapidly that a metastable liquid was first formed; resulting in complete intermixing of the multilayer; followed by crystallization to form solid phases. The integrated DSC enthalpies for both multilayer and bilayer films are consistent with this interpretation; which is further supported by thermodynamic predictions of metastable Ni/Si melting and solid state Ni/Si interdiffusion. Our results suggest that use of heating rates > 10000 °C/s may open new avenues for intermetallic micro- and nanofabrication; at temperatures well below those prevailing during explosive silicidation. © 2009 American Institute of Physics;
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