Optical properties and structural characterization of bias sputtered ZrO2 films

被引：0
|
作者：
Zhao, S. [1 ]
Ma, F. [1 ]
Xu, K.W. [1 ]
Liang, H.F. [2 ]
机构：
[1] State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China
[2] Key Laboratory of Film Technology and Optical Measurement, Xi'an Institute of Technology, Xi'an, 710032, China
来源：
Journal of Alloys and Compounds | 2008年 / 453卷 / 1-2期
基金：
中国国家自然科学基金;
关键词：
Annealing - Energy gap - Film preparation - Magnetron sputtering - Phase structure - Refractive index - Temperature measurement - Zirconia;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Journal article (JA)
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页码：453 / 457
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