Ion cleaning of facets for improving the reliability of high power 980 nm semiconductor lasers

被引:0
|
作者
Beijing Opto-electronic Technology Laboratory, Beijing University of Technology, Beijing 100022, China [1 ]
机构
来源
Chin. Phys. Lett. | 2006年 / 1卷 / 124-125期
关键词
Air cleaners - Semiconductor lasers - Indium alloys - Gallium alloys - Removal - Semiconducting indium gallium arsenide - Semiconductor diodes - Cleaning - Semiconductor alloys;
D O I
10.1088/0256-307X/23/1/036
中图分类号
学科分类号
摘要
We report a simple and available way of improving the reliability of high power InGaAs 980 nm lasers by cleaning the facets using Ar ion before the protecting films have been coated. The Ar cleaning can remove the impurity and the oxide on the air-cleaved facets of laser diodes. It is proven that the way has marked effect on reducing the gradual degradation rate of laser diodes and improving the catastrophic-optical-damage threshold. ©2005 Chinese Physical Society and IOP Publishing Ltd.
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