An experimental study of the feasibility of Li/SF6 slow combustion in a molten pool reactor

被引:0
|
作者
Military Representative Office of Naval Forces Resident at Harbin Turbine Works Co., Ltd., Harbin 150046, China [1 ]
不详 [2 ]
机构
来源
Reneng Dongli Gongcheng | 2007年 / 3卷 / 322-325期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] EXPERIMENTAL INVESTIGATION OF ELECTRIC-DISCHARGE IN SF6
    PFEIFFER, W
    SCHMITZ, W
    ELEKTROTECHNISCHE ZEITSCHRIFT ETZ-A, 1978, 99 (11): : 681 - 685
  • [22] Experimental study on fatigue characteristic of operating springs of SF6 circuit breakers
    邓集
    毛文奇
    黎治宇
    陈国平
    蒋新苗
    湖南电力, 2011, (05) : 16 - 19
  • [23] Experimental and Simulation Study on Degradation of SF6 by Dielectric Barrier Discharge Plasma
    Zhang X.
    Hu X.
    Xiao H.
    Zhongguo Dianji Gongcheng Xuebao/Proceedings of the Chinese Society of Electrical Engineering, 2017, 37 (08): : 2455 - 2464
  • [24] Experimental investigation of streamer radius and length in SF6
    Bujotzek, M.
    Seeger, M.
    Schmidt, F.
    Koch, M.
    Franck, C.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2015, 48 (24)
  • [25] Experimental studies on the statistical breakdown characteristic of SF6
    Finkel, M
    Boeck, W
    Jänicke, LR
    Kynast, E
    2000 ANNUAL REPORT CONFERENCE ON ELECTRICAL INSULATION AND DIELECTRIC PHENOMENA, VOLS. I & II, 2000, : 405 - 408
  • [26] EXPERIMENTAL-STUDY OF A SF6 ARC PLASMA AT ATMOSPHERIC-PRESSURE
    VACQUIE, S
    AMARA, MY
    GLEIZES, A
    KAFROUNI, H
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1982, 15 (05) : 885 - 900
  • [27] Experimental Investigation of the Dielectric Strength of Hot SF6
    Simka, P.
    Seeger, M.
    Votteler, T.
    Schwinne, M.
    2012 IEEE 10TH INTERNATIONAL CONFERENCE ON THE PROPERTIES AND APPLICATIONS OF DIELECTRIC MATERIALS (ICPADM), 2012,
  • [28] Experimental results of investigations of the electrical discharges in Ne/SF6/CH4 and Ne/SF6 mixtures
    Bychkov, Y
    Gortchakov, S
    Lacour, B
    ATOMIC AND MOLECULAR PULSED LASERS II, 1998, 3403 : 82 - 88
  • [29] ADHESION OF SLOW ELECTRONS TO SF6 AND CCL4 MOLECULES
    BUCHELNIKOVA, NS
    SOVIET PHYSICS JETP-USSR, 1958, 7 (02): : 358 - 359
  • [30] Etching silicon by SF6 in a continuous and pulsed power helicon reactor
    Herrick, A
    Perry, AJ
    Boswell, RW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (04): : 955 - 966