共 50 条
- [2] Effect of stage moving linear error on exposure in mask moving technique Guangdian Gongcheng, 2007, 11 (55-60):
- [4] Development of 3-axis nano stage for precision positioning in lithography system 2005 IEEE INTERNATIONAL CONFERENCE ON MECHATRONICS AND AUTOMATIONS, VOLS 1-4, CONFERENCE PROCEEDINGS, 2005, : 1598 - 1603
- [5] Development of precision underwater positioning system 2007 Symposium on Underwater Technology and Workshop on Scientific Use of Submarine Cables and Related Technologies, Vols 1 and 2, 2007, : 217 - 222
- [6] Development of nozzle positioning system for precision sprayer Proc. Int. Conf. Autom. Technol. Off-road Equip., 1600, (74-78):
- [7] Development of a Rapid Prototyping System for Microneedles Using Moving-mask Lithography with Backside Exposure ADVANCED BIOMEDICAL ENGINEERING, 2016, 5 : 63 - 67
- [8] The development of a linear motor driven precision grinding system for noncircular workpiece ADVANCED DESIGN AND MANUFACTURE IN THE GLOBAL MANUFACTURING ERA, VOL 2, 1997, : 538 - 543
- [10] System identification of a dual-stage XY precision positioning table PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2009, 33 (01): : 71 - 80