Crystal surface heat transfer during the growth of 300mm monocrystalline silicon by the Czochralski process

被引:0
|
作者
Wang, Zhengxing [1 ]
Ren, Yongsheng [1 ]
Ma, Wenhui [1 ,2 ]
Lv, Guoqiang [1 ]
Tan, Mingke [3 ]
Li, Xuehua [3 ]
Li, Shaoyuan [1 ]
Wan, Xiaohan [1 ]
Zhan, Shu [4 ]
Zeng, Yi [1 ]
Li, Ruopu [1 ]
机构
[1] National Engineering Research Center of Vacuum Metallurgy, Faculty of Metallurgical and Energy Engineering, Kunming University of Science and Technology, Kunming,650093, China
[2] School of Engineering, Yunnan University, Kunming,650500, China
[3] Lijiang LONGi Silicon Materials Co., Ltd, Lijiang,674802, China
[4] School of Computer and Information, Hefei University of Technology, Hefei,230601, China
基金
中国国家自然科学基金;
关键词
Crystal growth from melt - Radiative Cooling - Radiative transfer - Silicon wafers;
D O I
10.1016/j.ijheatmasstransfer.2024.126259
中图分类号
学科分类号
摘要
This paper investigated the lower heat transfer efficiency of ingot after increasing the size of Czochralski monocrystalline silicon. To improve the heat transfer efficiency, industrial Czochralski monocrystalline furnaces use water-cooling jackets to enhance crystal heat transfer. Through two-dimensional modeling, radiative heat transfer between monocrystalline silicon and the water-cooling jacket was investigated. The results showed that the effective radiation on the crystal surface decreased, then increased, and then decreased again. Numerical simulations showed that the maximum effective radiation on the surface was greater than 60 000 W/m2, which represents a significant increase in the heat flow density compared with the radiation of the crystal without using water cooling. According to the angle factor definition, a model of the radiative heat transfer angle factor between the water-cooling jacket and silicon rod was established. The dynamic correlation equation between the radiation angle factor and geometrical parameter of the hot zone, solidification rate, and solidification time was derived. Finally, a water-cooling jacket suitable for growing large monocrystalline silicon rod was designed according to the model, which improved the growth efficiency of the crystals. The results of the study are of great significance for optimizing water-cooling jackets. © 2024 Elsevier Ltd
引用
收藏
相关论文
共 50 条
  • [1] 300mm silicon crystal growth and wafer processing
    Tu, HL
    Zhou, QG
    Zhang, GH
    [J]. 2004: 7TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUITS TECHNOLOGY, VOLS 1- 3, PROCEEDINGS, 2004, : 2353 - 2355
  • [2] Numerical simulation of a czochralski silicon crystal growth with a large diameter 300mm under a cusp magnetic field
    Yu, HP
    Sui, YK
    Zhang, FY
    Chang, XA
    An, GP
    [J]. JOURNAL OF INORGANIC MATERIALS, 2005, 20 (02) : 453 - 458
  • [3] Heat transfer in Czochralski crystal growth process
    Ogino, F
    [J]. HEAT TRANSFER SCIENCE AND TECHNOLOGY 1996, 1996, : 29 - 41
  • [4] Oxygen transport in the Czochralski growth of 300 mm diameter silicon crystal
    Zhang, T
    Wang, GX
    Zhang, H
    Ladeinde, F
    Prasad, V
    [J]. HIGH PURITY SILICON V, 1998, 98 (13): : 17 - 27
  • [6] HEAT-TRANSFER IN SILICON CZOCHRALSKI CRYSTAL-GROWTH
    WILLIAMS, G
    REUSSER, RE
    [J]. JOURNAL OF CRYSTAL GROWTH, 1983, 64 (03) : 448 - 460
  • [7] Modeling of Defects Generation in 300 mm Silicon Monocrystals during Czochralski Growth
    Lee, Sang Hun
    Song, Do Won
    Oh, Hyun Jung
    Kim, Do Hyun
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (12)
  • [8] Numerical simulation of 300mm CZ silicon crystal growth with axial magnetic fields
    Xu, Wenting
    Tu, Hailing
    Chang, Qing
    Xiao, Qinghua
    Dai, Xiaolin
    Liu, Yunxia
    Li, Zongfeng
    Chang, Lin
    Liu, Weida
    [J]. MATERIALS MODELING, SIMULATION, AND CHARACTERIZATION, 2011, 689 : 179 - +
  • [9] Research Progress of Crystal Defects During the Growth of Large Size Czochralski Monocrystalline Silicon
    Zhou, Xiang
    Li, Tai
    Huang, Zhenling
    Zhao, Liang
    Kang, Jiaming
    Li, Shaoyuan
    Reng, Yongsheng
    Ma, Wenhui
    Lyu, Guoqiang
    [J]. Cailiao Daobao/Materials Reports, 2024, 38 (24):
  • [10] Principle, Process and Prospect of Monocrystalline Silicon Growth with Czochralski Method
    Wang, Zhengxing
    Ren, Yongsheng
    Ma, Wenhui
    Lyu, Guoqiang
    Zeng, Yi
    Zhan, Shu
    Chen, Hui
    Wang, Zhe
    [J]. Cailiao Daobao/Materials Reports, 2024, 38 (09):