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- [4] Analysis of Fixed Abrasive Pads with a Nano-sized Diamond for Silicon Wafer Polishing ADVANCES IN ABRASIVE TECHNOLOGY XII, 2009, 76-78 : 410 - +
- [5] Study on Characteristic of Abrasives in Chemical Mechanical Polishing of Silicon Wafer DIGITAL DESIGN AND MANUFACTURING TECHNOLOGY, PTS 1 AND 2, 2010, 102-104 : 658 - 662
- [6] Effect of characteristics of nano-colloidal silica abrasives on wafer surface roughness for wafer touch polishing NANOSCIENCE AND TECHNOLOGY, PTS 1 AND 2, 2007, 121-123 : 1229 - 1232
- [7] Study on Polishing Technology of GaAs Wafer ULTRA-PRECISION MACHINING TECHNOLOGIES, 2012, 497 : 200 - 204
- [9] The haze of a wafer: A new approach to monitor nano-sized particles PARTICLES ON SURFACES 8: DETECTION, ADHESION AND REMOVAL, 2003, : 47 - 62