Thickness effects on pH response of HfO2 sensing dielectric improved by rapid thermal annealing

被引：0
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作者：
Lai, Chao-Sung [1 ]
Yang, Chia-Ming [1 ]
Lu, Tseng-Fu [1 ]
机构：
[1] Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2006年 / 45卷 / 4 B期
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Journal article (JA)
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页码：3807 / 3810
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