Analysis of printability of scratch defect on reflective mask in extreme ultraviolet lithography

被引：0
|
作者：
Association of Super-Advanced Electronic Technologies, EUV Process Technology Research Laboratory, C/o NTT Atsugi R and D Center, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan [1 ]
不详 [2 ]
机构：
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2006年 / 45卷 / 12期
关键词：
33;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Journal article (JA)
引用
收藏
页码：9044 / 9052
相关论文
共 50 条
  • [1] Analysis of printability of scratch defect on reflective mask in extreme ultraviolet lithography
    Sugawara, Minoru
    Nishiyama, Iwao
    Motai, Kumi
    Cullins, Jerry
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (12): : 9044 - 9052
  • [2] Illuminating extreme ultraviolet lithography mask defect printability
    Badger, Karen D.
    Qi, Zhengqing John
    Gallagher, Emily
    Seki, Kazunori
    McIntyre, Gregory
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2013, 12 (02):
  • [3] Residual-type mask defect printability for extreme ultraviolet lithography
    Amano, Tsuyoshi
    Iida, Susumu
    Hirano, Ryoichi
    Terasawa, Tsuneo
    Watanabe, Hidehiro
    Inazuki, Yuichi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2012, 30 (06):
  • [4] Low-defect reflective mask blanks for Extreme Ultraviolet Lithography
    Burkhart, S
    Cerjan, C
    Kearney, P
    Mirkarimi, P
    Walton, C
    Ray-Chaudhuri, A
    EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 570 - 577
  • [5] Extreme Ultraviolet Lithography - reflective mask technology
    Walton, CC
    Kearney, PA
    Mirkarimi, PB
    Bowers, JM
    Cerjan, C
    Warrick, AL
    Wilhelmsen, K
    Fought, E
    Moore, C
    Larson, C
    Baker, S
    Burkhart, SC
    Hector, SD
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 496 - 507
  • [6] Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks
    Farys, V
    Charpin-Nicolle, C
    Richard, M
    Robic, JY
    Muffato, V
    Quesnel, E
    Postnikov, S
    Schiavone, P
    Besacier, M
    Smaali, R
    Naulleau, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06): : 2860 - 2865
  • [7] Patterning Dependence on the Mask Defect for Extreme Ultraviolet Lithography
    Ji, Hye-Rim
    Kim, In-Seon
    Kim, Guk-Jin
    Park, Jin-Goo
    Kim, Min-Su
    Yeung, Micheal
    Barouch, Eytan
    Oh, Hye-Keun
    PHOTOMASK JAPAN 2015: PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXII, 2015, 9658
  • [8] Mask defect management in extreme-ultraviolet lithography
    Chen, Nai-Ching
    Yu, Chia-Hao
    Yu, Ching-Fang
    Lu, Chi-Lun
    Chu, James
    Hsu, Luke
    Chin, Angus
    Yen, Anthony
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 13 (02):
  • [9] Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability
    Terasawa, Tsuneo
    Arisawa, Yukiyasu
    Amano, Tsuyoshi
    Yamane, Takeshi
    Watanabe, Hidehiro
    Toyoda, Mitsunori
    Harada, Tetsuo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (09)
  • [10] Defect repair for extreme ultraviolet lithography (EUVL) mask blanks
    Hau-Riege, SP
    Barty, A
    Mirkarimi, PB
    Stearns, DG
    Chapman, H
    Sweeney, D
    Clift, M
    Gullikson, E
    Yi, MS
    EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 331 - 338
12345