Metal-Assisted chemical etching using silica nanoparticle for the fabrication of a silicon nanowire array

被引：0
|
作者：
Kato, Shinya [1 ]
Watanabe, Yuya [1 ]
Kurokawa, Yasuyoshi [1 ]
Yamada, Akira [1 ,2 ]
Ohta, Yoshimi [3 ]
Niwa, Yusuke [3 ]
Hirota, Masaki [3 ]
机构：
[1] Department of Physical Electronics, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
[2] Photovoltaics Research Center (PVREC), Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan
[3] Advanced Materials Laboratory, Nissan Research Center, Yokosuka, Kanagawa 237-8523, Japan
来源：
Japanese Journal of Applied Physics | 2012年 / 51卷 / 2 PART 2期
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摘要：
Silica nanoparticles
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