Microwave-excited blowing plasmas using microstrip lines for atmospheric pressure CVD

被引:0
|
作者
Kim J. [1 ]
Kim D. [2 ]
Ohsaki H. [2 ]
Katsurai M. [3 ]
机构
[1] Nanotube Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Central 5
[2] Department of Advanced Energy, Graduate School of Frontier Sciences, University of Tokyo, Kashiwa 277-8561, 5-1-5, Kashiwanoha
[3] Tokyo Bunkyo Study Center, Open University of Japan, Bunkyo-ku, Tokyo 112-0012, 3-29-1, Ohtsuka
关键词
Atmospheric pressure plasma; Carbon material; CVD; Microstrip line; Microwave excited plasma;
D O I
10.1541/ieejfms.130.913
中图分类号
学科分类号
摘要
Chemical vapor depositions using nonthermal atmospheric pressure plasmas have attracted special attentions because they eliminate expensive and complicated vacuum systems and provide many more active chemical species. We report an advanced 2.45 GHz microwave-excited blowing plasma system which was fabricated using microstrip lines, instead of conventional waveguides. The plasma system provides a plasma source with a long lifetime, stability, robustness, and simplicity even at atmospheric pressure. The blowing plasma permits the carbon materials deposition in atmospheric ambient air. © 2010 The Institute of Electrical Engineers of Japan.
引用
收藏
页码:913 / 918
页数:5
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