Design of antenna for RF inductively coupled plasma ion beam source

被引：0
|
作者：
Su, Zhi-Wei [1 ]
Chen, Qing-Chuan [1 ]
Han, Da-Kai [1 ]
机构：
[1] Southwestern Institute of Physics, Chengdu 610041, China
来源：
Hejubian Yu Dengliziti Wuli/Nuclear Fusion and Plasma Physics | 2007年 / 27卷 / 01期
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摘要：
To obtain more uniform beam, three types of antennas of the inductively coupled plasma ion beam source applied to the etching have been designed. The electric field distributions excited by these antennas were calculated and compared. The results show that the linear non-equidistant antenna and the parallel multi-spiral antenna are capable of generating fairly uniform electric field distributions with comparatively higher coupling efficiency.
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页码：73 / 76
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