Electronic properties of ultrathin Hf O2, Al2 O 3, and Hf-Al-O dielectric films on Si(100) studied by quantitative analysis of reflection electron energy loss spectra

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作者：
Jin, Hua [1 ]
Oh, Suhk Kun [1 ]
Kang, Hee Jae [1 ]
Tougaard, Sven [2 ]
机构：
[1] BK21 Physics Program, Department of Physics, Chungbuk National University, Cheongju 361-763, Korea, Republic of
[2] Physics Department, University of Southern Denmark, Campusvej 55, 5230 Odense M, Denmark
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Journal of Applied Physics | 2006年 / 100卷 / 08期
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