Atomistic simulation of environment-assisted crack propagation behavior of SiO2

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作者
Yasukawa, Akio [1 ]
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[1] Hitachi, Ltd., Automotive Systems, 2520 Takaba, Hitachinaka-shi, Ibaraki, 312-8503, Japan
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D O I
10.1299/kikaia.75.866
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页码:866 / 872
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