A detailed experimental and analytical study of the thermal expansion of dielectric thin films on Si by x-ray reflectivity

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作者：
Phung, T.M. [4 ]
Johnson, D.C. [1 ,2 ]
Antonelli, G.A. [3 ,4 ]
机构：
[1] Materials Science Institute, University of Oregon, Eugene, OR 97403
[2] Department of Chemistry, University of Oregon, Eugene, OR 97403
[3] Intel Corporation, Portland Technology Development, Hillsboro, OR 97124
[4] Physics Department, Brown University, Providence, RI 02912
来源：
Journal of Applied Physics | 2006年 / 100卷 / 06期
关键词：
Thin films;
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摘要：
Journal article (JA)
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