Low-temperature deposition of polycrystalline silicon thin films by ECR-PECVD

被引：0
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作者：
Wang, Yan-Yan [1 ]
Qin, Fu-Wen [1 ]
Wu, Ai-Min [1 ]
Feng, Qing-Hao [1 ]
机构：
[1] State Key Lab. of Material Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
来源：
Bandaoti Guangdian/Semiconductor Optoelectronics | 2006年 / 27卷 / 04期
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页码：412 / 415
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