An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography

被引：2
|
作者：
Xu, Feifan [1 ,2 ,3 ]
Ding, Yinye [2 ]
Chen, Wenhao [3 ]
Xia, Haojie [1 ,2 ]
机构：
[1] Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, Hefei University of Technology, Hefei,230009, China
[2] Anhui Provincial Engineering Research Center of Semiconductor Inspection Technology and Instrument, Hefei University of Technology, Hefei,230009, China
[3] School of Instrument Science and Opto-Electronics Engineering, Hefei University of Technology, Hefei,230009, China
来源：
Micromachines | 2024年 / 15卷 / 12期
关键词：
D O I：
10.3390/mi15121408
中图分类号：
学科分类号：
摘要：
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