System optimization of 4f-based planar-integrated hybrid-optoelectronic correlator

被引：0
|
作者：
Xu H. [1 ]
Xu P. [1 ]
Qi S. [1 ]
Liang Q. [1 ]
Zhang X. [1 ]
Huang J. [1 ]
Huang H. [1 ]
机构：
[1] College of Electronic Science and Technology, Shenzhen University, Shenzhen
来源：
Guangxue Xuebao/Acta Optica Sinica | 2010年 / 30卷 / 04期
关键词：
Aberration analysis; Binary optics; Image quality evaluation; Optical pattern recognition; Structure optimization;
D O I：
10.3788/AOS20103004.1002
中图分类号：
学科分类号：
摘要：
The folded optical structure used in 4f-based planar-integrated opto-electronic hybrid correlator system, increases aberration and reduces the system's recognition ability. The phase modulation function of micro-optical lens is determined, by using the theory of oblique incidence corrdinates to analyse planar integrated optical correlator structure. Then the system aberration is reduced and thereby the recognition ability is enhanced, by analysing the phase function of micro-optical lens elements and using Zemax software optimization system. The optimized system's maximum optical path difference is less than λ/4 and the system attains diffraction limited performance. The contrastive and quantitating analysis is simulated by Matlab, the result show that the optimized system's recognition performance has been improved by 0.8 times. It shows that the aberration has been improved well, the system's recognition ability has been significantly enhanced.
引用
收藏
页码：1002 / 1008
页数：6
相关论文
共 26 条
  • [11] Xu P., Li J., Fabricate uniform device of excimer exposure system using deep-etched binary optics technology produced, Science in China(series E), 30, 6, pp. 510-518, (2000)
  • [12] Xu P., Zhou X., Zhang X., Et al., Optical perfect shuffle interconnection using computer-generated blazed grating array, Optical Review (Japan), 2, 5, pp. 362-365, (1995)
  • [13] Xu P., Zhang X., Guo L., Et al., Fabrication errors analysis and simulation of binary optical element, Acta Optica Sinica, 16, 6, pp. 833-838, (1996)
  • [14] Xu P., Tang J., Guo L., Et al., Deep etch binary optics element, Acta Optica Sinica, 16, 12, pp. 1276-1281, (1996)
  • [15] Xu P., Tang J., Guo L., Et al., Diffraction analysis on deep-etch continuous phase relief microoptical elements, Chinese J. Lasers, 23, 9, pp. 819-823, (1996)
  • [16] Xu P., Tang J., Guo L., Et al., Fabricaion errors simulation of deep etched binary optics elements, Chinese J. Lasers, 24, 6, pp. 536-542, (1997)
  • [17] Xu P., Li J., Bu G., Et al., Fabrication error analysis of 4 step binary optic elements, Chinese J. Lasers, A25, 5, pp. 415-420, (1998)
  • [18] Yu D., Tan H., Engineering Optics, 1, pp. 27-28, (2001)
  • [19] O'Callaghan M.J., Compact optical processing systems using off-axis diffractive optics and FLC-VLSI spatial light modulators, 2824, pp. 72-80, (1996)
  • [20] Testorf M., Paraxial theory of planar integrated systems, J. Opt. Soc. Am., 14, 7, pp. 1569-1575, (1997)
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