Homogenizing dielectric film using chemical solution deposition method and application to wafer level film preparation

被引：0
|
作者：
Sueshige, Kazutaka [1 ]
Ichiki, Masaaki [2 ,3 ]
Suga, Tadatomo [1 ]
Itoh, Toshihiro [2 ]
机构：
[1] University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
[2] National Institute of Advanced Industrial Science and Technology, 1-2-1, Namiki, Tsukuba, Ibaraki 305-8564, Japan
[3] JST-PRESTO, 7, Goban-Cho, Chiyoda-ku, Tokyo 102-0076, Japan
来源：
IEEJ Transactions on Sensors and Micromachines | 2013年 / 133卷 / 07期
关键词：
Design of experiments;
D O I：
10.1541/ieejsmas.133.303
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：303 / 308
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