Microstructures and properties of silicon nitride films grown by unbalanced magnetron sputtering

被引：0
|
作者：
Jing, Fengjuan [1 ]
Zhang, Qi [1 ]
Leng, Yongxiang [1 ]
Sun, Hong [1 ]
Yang, Ping [1 ]
Huang, Nan [1 ]
机构：
[1] Key Lab. for Advanced Technologies of Materials Ministry of Education, School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu 610031, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2009年 / 29卷 / 05期
关键词：
D O I：
10.3969/j.issn.1672-7126.2009.05.17
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：541 / 545
相关论文
共 50 条
  • [1] Microstructures and properties of titanium nitride film grown by unbalanced magnetron sputtering
    Zhang, Qi
    Tao, Tao
    Qi, Feng
    Liu, Yanwen
    Leng, Yongxiang
    Huang, Nan
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2007, 27 (02): : 163 - 167
  • [2] PROPERTIES OF SILICON-NITRIDE FILMS PREPARED BY MAGNETRON SPUTTERING
    HIROHATA, Y
    SHIMAMOTO, N
    HINO, T
    YAMASHIMA, T
    YABE, K
    THIN SOLID FILMS, 1994, 253 (1-2) : 425 - 429
  • [3] Investigation of substoichiometric titanium nitride grown by unbalanced magnetron sputtering
    Yang, S
    Lewis, DB
    Wadsworth, I
    Cawley, J
    Brooks, JS
    Münz, WD
    SURFACE & COATINGS TECHNOLOGY, 2000, 131 (1-3): : 228 - 233
  • [4] Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering
    Shen, YG
    Liu, ZJ
    Jiang, N
    Zhang, HS
    Chan, KH
    Xu, ZK
    JOURNAL OF MATERIALS RESEARCH, 2004, 19 (02) : 523 - 534
  • [5] Effect of silicon addition on surface morphology and structural properties of titanium nitride films grown by reactive unbalanced direct current-magnetron sputtering
    Y. G. Shen
    Z. J. Liu
    N. Jiang
    H. S. Zhang
    K. H. Chan
    Z. K. Xu
    Journal of Materials Research, 2004, 19 : 523 - 534
  • [6] Control of microstructures and properties of dc magnetron sputtering deposited chromium nitride films
    Zhang, Z. G.
    Rapaud, O.
    Bonasso, N.
    Mercs, D.
    Dong, C.
    Coddet, C.
    VACUUM, 2008, 82 (05) : 501 - 509
  • [7] Superconducting niobium nitride films deposited by unbalanced magnetron sputtering
    Olaya, J. J.
    Huerta, L.
    Rodil, S. E.
    Escamilla, R.
    THIN SOLID FILMS, 2008, 516 (23) : 8768 - 8773
  • [8] Microstructures and tribological properties of TiC/a-C films grown by magnetron sputtering
    Zhang, Wenyan
    Zhang, Xuhai
    Fang, Feng
    Jiang, Jianqing
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2009, 29 (03): : 282 - 286
  • [9] Microstructures and mechanical properties of vanadium carbide films grown by reactive magnetron sputtering
    Li, Guangze
    Wu, Xiaoyan
    Chen, Yanghui
    Li, Geyang
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2009, 29 (02): : 168 - 172
  • [10] Optical properties of tantalum nitride films fabricated using reactive unbalanced magnetron sputtering
    Aouadi, SM
    Debessai, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (05): : 1975 - 1979
12345