Fingerprint orientation correction based on the optimal model residual error

被引：0
|
作者：
Chen, Wei-Min
Li, Jian-Wei
Xu, Dong-Xia
Wang, Xu-Chu
机构：
[1] Key Lab of Optoelectric Technique and System, Ministry of Education, Chongqing University, Chongqing 400044, China
[2] Department of Electronical Information and Mechanical Engineering, Kunming University, Kunming 650118, China
来源：
Guangdian Gongcheng/Opto-Electronic Engineering | 2006年 / 33卷 / 08期
关键词：
10;
D O I：
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学科分类号：
摘要：
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页码：26 / 31
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