Ti-doped copper nitride films deposited by cylindrical magnetron sputtering

被引：0
|
作者：
Fan, X.Y. [1 ]
Wu, Z.G. [1 ]
Zhang, G.A. [1 ]
Li, C. [1 ]
Geng, B.S. [1 ]
Li, H.J. [1 ]
Yan, P.X. [1 ,2 ]
机构：
[1] School of Physical Science and Technology, Lanzhou University, Lanzhou, 730000, China
[2] Key Laboratory of Solid Lubrication, Institute of Chemical and Physics, Chinese Academy of Science, Lanzhou, 730000, China
来源：
Journal of Alloys and Compounds | 2007年 / 440卷 / 1-2期
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页码：254 / 258
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