Binding force of SiC films prepared by magnetron sputtering on carbon steel

被引:0
|
作者
Shao, Hong-Hong [1 ]
Zhang, Ye [1 ]
Gao, Jian-Chang [1 ]
Hua, Ji-Yun [1 ]
机构
[1] School of Materials Science and Technology, Jiangsu University, Zhenjiang 212013, China
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:50 / 53
相关论文
共 50 条
  • [31] Characterization of carbon thin films prepared by high power impulse magnetron sputtering
    Nawachi N.
    Itoh K.
    Isagi Y.
    Yoshida Y.
    Okamoto K.
    Nakatani T.
    1600, Vacuum Society of Japan (60): : 341 - 345
  • [32] Corrosion performance of thin hydrogenated amorphous carbon films prepared by magnetron sputtering
    Shi, J. R.
    Ji, R.
    Piramanayagam, S. N.
    DIAMOND AND RELATED MATERIALS, 2007, 16 (09) : 1716 - 1721
  • [33] Characteristics of W Doped Nanocrystalline Carbon Films Prepared by Unbalanced Magnetron Sputtering
    Park, Yong Seob
    Park, Chul Min
    Kim, Nam-Noon
    Kim, Jae-Moon
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2016, 16 (05) : 4989 - 4992
  • [34] Influence of rf power on carbon nitride films prepared by rf magnetron sputtering
    Jiang, LD
    Fitzgerald, AG
    Rose, MJ
    FOURTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2000, 4086 : 540 - 543
  • [35] Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating
    Schwan, J
    Ulrich, S
    Roth, H
    Ehrhardt, H
    Silva, SRP
    Robertson, J
    Samlenski, R
    Brenn, R
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (03) : 1416 - 1422
  • [36] Microstructure and hardness of SiC-TiC nanocomposite thin films prepared by radiofrequency magnetron sputtering
    Osugi, Gaku
    Ito, Akihiko
    Hotta, Mikinori
    Goto, Takashi
    THIN SOLID FILMS, 2012, 520 (18) : 5851 - 5855
  • [37] Indium doping of amorphous SiC:H films prepared by reactive magnetron co-sputtering
    Saito, N
    Inui, Y
    Yamaguchi, T
    Nakaaki, I
    THIN SOLID FILMS, 1999, 353 (1-2) : 189 - 193
  • [38] Indium doping of amorphous SiC:H films prepared by reactive magnetron co-sputtering
    Takamatsu Natl. Coll. of Technology, Takamatsu 761-8058, Japan
    不详
    不详
    Thin Solid Films, 1 (189-193):
  • [39] Corrosion and wear resistance of SiC:Cu:a-C composite films prepared by magnetron sputtering
    Zhang, Jianhui
    Cao, Xiu
    Jiang, Aihua
    Ru, Lu
    Tao, Simin
    Xiao, Jianrong
    SURFACE & COATINGS TECHNOLOGY, 2023, 464
  • [40] β-FeSi2 films prepared on 6H-SiC substrates by magnetron sputtering
    李虹
    蒲红斌
    郑春蕾
    陈治明
    Journal of Semiconductors, 2015, (06) : 33 - 38