Nickel distribution and recombination activity in as-grown and annealed multicrystalline silicon

被引：0
|
作者：
Kojima, Takuto [1 ]
Tachibana, Tomihisa [1 ]
Kojima, Nobuaki [1 ]
Ohshita, Yoshio [1 ]
Arafune, Koji [2 ]
Ogura, Atsushi [3 ]
Yamaguchi, Masafumi [1 ]
机构：
[1] Toyota Technological Institute, Nagoya 468-8511, Japan
[2] University of Hyogo, Himeji, Hyogo 671-2201, Japan
[3] Meiji University, Kawasaki 214-8571, Japan
来源：
Japanese Journal of Applied Physics | 2014年 / 53卷 / 4 SPEC. ISSUE期
关键词：
531.2 Metallography - 537.1 Heat Treatment Processes - 548.1 Nickel - 549.3 Others; including Bismuth; Boron; Cadmium; Cobalt; Mercury; Niobium; Selenium; Silicon; Tellurium and Zirconium - 933.1 Crystalline Solids and Crystallography - 933.1.1 Crystal Lattice;
D O I：
04ER20
中图分类号：
学科分类号：
摘要：
26
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