Fabrication of diffraction grating with high aspect ratio using X-ray lithography technique for X-ray phase imaging

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Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1- 2 Koto, Kamigori-cho, Ako-gun, Hyogo 678-1205, Japan ^{[1
]}

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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1600年 / 46卷 / 02期

关键词：

The use of conventional X-ray radiography is limited due to weak absorption. This problem is resolved by using phasesensitive imaging methods to improve the contrast; such as X-ray Talbot interferometry. With a spatially coherent light source and two diffraction gratings for Talbot interferometry; we measured the phase change differential. Using this technique; diffraction gratings were designed to have a fine high-accuracy high-aspect-ratio structure. Then; we fabricated a high-aspectratio diffraction grating using a deep X-ray lithography technique. A diffraction grating with a period of 8 μm and a height of about 30 μm was fabricated. This diffraction grating can be used for X-ray phase imaging for X-ray Talbot interferometry. © 2007 The Japan Society of Applied Physics;

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页码：849 / 851

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