Study of the annealing kinetic effect and implantation energy on phosphorus-implanted silicon wafers using spectroscopic ellipsometry

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作者：
Lioudakis, Emmanouil [1 ]
Christofides, Constantinos [1 ]
Othonos, Andreas [1 ]
机构：
[1] Photonics and Optoelectronics Research Laboratory, Department of Physics, University of Cyprus, P.O. Box 20537, 1678 Nicosia, Cyprus
来源：
Journal of Applied Physics | 2006年 / 99卷 / 12期
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