Simplified microfabrication technology for producing SU-8 microstructures with high aspect ratio

被引:0
|
作者
Lu, Chun-Hua [1 ]
Yin, Xue-Feng [1 ]
Liu, Dong-Yuan [1 ]
Fang, Zhao-Lun [1 ]
机构
[1] Department of Chemistry, Zhejiang University, Hangzhou 310027, China
关键词
11;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:1289 / 1292
相关论文
共 50 条
  • [21] Fabrication of high aspect ratio metallic microstructures on ITO glass substrate using reverse-side exposure of SU-8
    Lu, Chunhua
    Yin, Xuefeng
    Wang, Min
    SENSORS AND ACTUATORS A-PHYSICAL, 2007, 136 (01) : 412 - 416
  • [22] High aspect ratio SU-8 structures for 3-D culturing of neurons
    Choi, Y
    Powers, R
    Vernekar, V
    Frazier, AB
    LaPlaca, MC
    Allen, MG
    MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS) - 2003, 2003, : 651 - 654
  • [23] SU-8 plating mold for high-aspect-ratio nickel zone plates
    Lindblom, M.
    Hertz, H. M.
    Holmberg, A.
    MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 1136 - 1139
  • [24] Study of crack formation in high-aspect ratio SU-8 structures on silicon
    Bystrova, S.
    Luttge, R.
    van den Berg, A.
    MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 1113 - 1116
  • [25] Fabrication of support structures to prevent SU-8 stiction in high aspect ratio structures
    Vora, K. D.
    Peele, A. G.
    Shew, B. -Y.
    Harvey, E. C.
    Hayes, J. P.
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2007, 13 (5-6): : 487 - 493
  • [26] Fabrication of support structures to prevent SU-8 stiction in high aspect ratio structures
    K. D. Vora
    A. G. Peele
    B.-Y. Shew
    E. C. Harvey
    J. P. Hayes
    Microsystem Technologies, 2007, 13 : 487 - 493
  • [27] Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process
    Schneider, A
    Su, B
    Button, TW
    Singleton, L
    Wilhelmi, O
    Huq, SE
    Prewett, PD
    Lawes, RA
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2002, 8 (2-3): : 88 - 92
  • [28] Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process
    A. Schneider
    B. Su
    T. W. Button
    L. Singleton
    O. Wilhelmi
    S. E. Huq
    P. D. Prewett
    R. A. Lawes
    Microsystem Technologies, 2002, 8 : 88 - 92
  • [29] Fabrication of high-aspect-ratio microstructures using SU8 photoresist
    Liu, G
    Tian, Y
    Kan, Y
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2005, 11 (4-5): : 343 - 346
  • [30] Fabrication of high-aspect-ratio microstructures using SU8 photoresist
    G. Liu
    Y. Tian
    Y. Kan
    Microsystem Technologies, 2005, 11 : 343 - 346