Stability and dissolution of single-crystalline iron oxide thin films in electrochemical environments

被引:0
|
作者
Seidel, Peter [1 ]
Pomp, Sascha [1 ]
Schwarz, Florian [1 ]
Sterrer, Martin [1 ]
机构
[1] Karl Franzens Univ Graz, Inst Phys, NAWI Graz, Universitatsplatz 5, A-8010 Graz, Austria
关键词
Iron oxide; Thin films; Dissolution; Electrochemistry; Catechol; METHANOL OXIDATION; SURFACE-CHEMISTRY; CATECHOL; PLATINUM; WATER; ADSORPTION; CATALYSTS; ELECTROCATALYSTS; HYDROXYLATION; HYDROQUINONE;
D O I
10.1016/j.susc.2024.122621
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The stability of single-crystalline monolayer FeO(111) and 10 nm thin Fe3O4(111) 3 O 4 (111) films on Pt(111) upon exposure to environments of increasing chemical complexity has been studied with X-ray photoelectron spectroscopy, temperature-programmed desorption, in-situ scanning tunneling microscopy, and cyclic voltammetry. The well-defined oxide films, which were prepared under ultrahigh-vacuum conditions, were exposed to aqueous solutions of different pH and electrochemical cycling in pure and catechol-containing electrolyte. The films are stable in neutral (pH 7) and alkaline (pH 13) solutions both at open circuit conditions and during electrochemical cycling within the limits of hydrogen and oxygen evolution potentials. Also in strongly acidic (pH 1) perchlorate solution the films remain intact under open circuit conditions, but they quickly dissolve on application of electrochemical potential. Especially for the ultrathin FeO(111) films, catechol enhances the dissolution at neutral pH during electrochemical cycling. A comparison of Pt(111), FeO(111) and Fe3O4(111) 3 O 4 (111) substrates in the electrochemical catechol oxidation reaction reveals enhanced and sustained activity of FeO in alkaline environment, while strong deactivation occurs on Pt(111) and Fe3O4(111). 3 O 4 (111). This is explained by the weaker interaction between catechol and FeO(111) compared to the other substrates, which hampers the formation of a barrier layer on the electrode surface.
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Electrochemical immobilization of Cs in single-crystalline SYNROC
    Abe, H
    Satoh, A
    Nishida, K
    Abe, E
    Ncaka, T
    Imai, M
    Kitazawa, H
    JOURNAL OF SOLID STATE CHEMISTRY, 2006, 179 (05) : 1521 - 1524
  • [42] Epitaxial growth of homogeneous single-crystalline AlN films on single-crystalline Cu (111) substrates
    Wang, Wenliang
    Yang, Weijia
    Liu, Zuolian
    Lin, Yunhao
    Zhou, Shizhong
    Qian, Huirong
    Gao, Fangliang
    Yang, Hui
    Li, Guoqiang
    APPLIED SURFACE SCIENCE, 2014, 294 : 1 - 8
  • [43] Diffusion of iron and nickel in single-crystalline copper
    Almazouzi, A
    Macht, MP
    Naundorf, V
    Neumann, G
    PHYSICAL REVIEW B, 1996, 54 (02): : 857 - 863
  • [44] GROWTH OF SINGLE-CRYSTALLINE ALUMINUM FILMS ON LITHIUM-FLUORIDE AND MAGNESIUM-OXIDE THIN-FILM SUBSTRATES
    REICHELT, K
    SRINIVASAN, S
    THIN SOLID FILMS, 1975, 30 (01) : L7 - L10
  • [45] ELECTROCHEMICAL DISSOLUTION OF THIN METALLIC FILMS
    SOROKIN, IN
    SEMYACHK.GY
    LAVRISHC.VP
    RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY,USSR, 1972, 46 (04): : 612 - 613
  • [46] PHOTOGRAPHIC PROPERTIES OF SINGLE-CRYSTALLINE AGBR FILMS
    HAEFKE, H
    KROHN, M
    ENEVA, J
    JOURNAL OF PHOTOGRAPHIC SCIENCE, 1992, 40 (03): : 70 - 75
  • [47] Silica films with a single-crystalline mesoporous structure
    Miyata, H
    Suzuki, T
    Fukuoka, A
    Sawada, T
    Watanabe, M
    Noma, T
    Takada, K
    Mukaide, T
    Kuroda, K
    NATURE MATERIALS, 2004, 3 (09) : 651 - 656
  • [48] Silica films with a single-crystalline mesoporous structure
    Hirokatsu Miyata
    Takashi Suzuki
    Ayumu Fukuoka
    Takeshi Sawada
    Masatoshi Watanabe
    Takashi Noma
    Kazuhiro Takada
    Taihei Mukaide
    Kazuyuki Kuroda
    Nature Materials, 2004, 3 : 651 - 656
  • [49] ELECTROCHEMICAL STABILITY OF INDIUM TIN OXIDE THIN-FILMS
    MARTINEZ, MA
    HERRERO, J
    GUTIERREZ, MT
    ELECTROCHIMICA ACTA, 1992, 37 (14) : 2565 - 2571
  • [50] Porous crystalline iron oxide thin films templated by mesoporous silica
    Shi, KY
    Peng, LM
    Chen, Q
    Wang, RH
    Zhou, WZ
    MICROPOROUS AND MESOPOROUS MATERIALS, 2005, 83 (1-3) : 219 - 224