Development of new LTCC material for Low-k/Ultra Low-k device

被引:0
|
作者
R and D Center Kagoshima, Kyocera Corporation, Kagoshima 899-4312, Japan [1 ]
机构
来源
J. Jpn. Inst. Electron. Packag. | 2008年 / 2卷 / 147-151期
关键词
Silicate minerals - Low-k dielectric - Mountings - Glass;
D O I
10.5104/jiep.11.147
中图分类号
学科分类号
摘要
The new LTCC material has been developed by crystallization of glass compositions in the firing process so that the major amount of glass becomes cordierite. The new material has CTE (coefficient of thermal expansion) of 3.4E-6/degree Celsius and dielectric constant of 5.6. The CTE of the new LTCC material is very close to that of silicon, which realizes high mounting reliability of a silicon device. We have measured the maximum principal stress in a silicon device mounted on test packages, using a piezoelectric element built-in the device. In the case of our new LTCC package, the stress in the device was around 0Mp, while a Build-Up package (CTE: 17.0 E-6/degree Celsius) has shown the stress about 80MPa. Our new LTCC material can be co-fired with copper conductor, which realized high effective conductivity and low transmission loss. The new LTCC material has been confirmed to be a promising solution of packages for Low-k and Ultra Low-k devices.
引用
收藏
相关论文
共 50 条
  • [31] Yielding a low-k solution
    Narasimhan, Murali
    European Semiconductor, 2004, 26 (04):
  • [32] Lithographic performance of a new "low-k" mask
    Adachi, Takashi
    Tani, Ayako
    Fujimura, Yukihiro
    Hayano, Katsuya
    Morikawa, Yasutaka
    Miyashita, Hiroyuki
    Inazuki, Yukio
    Kawai, Yoshio
    PHOTOMASK JAPAN 2016: XXIII SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY, 2016, 9984
  • [33] Low-k dielectric materials
    Shamiryan, D.
    Abell, T.
    Iacopi, F.
    Maex, K.
    MATERIALS TODAY, 2004, 7 (01) : 34 - 39
  • [34] Design implications of low-K
    Sánchez, H
    PROCEEDINGS OF THE IEEE 2003 INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, 2003, : 3 - 5
  • [35] True low-k discovered
    不详
    MICRO, 2004, 22 (01): : 28 - 28
  • [36] Supercritical carbon dioxide cleaning of low-k material
    Asai, G
    Muraoka, Y
    Saito, K
    Mizobata, I
    Iwata, T
    Masuda, K
    Iijima, K
    Yoshikawa, T
    Peters, D
    ULTRA CLEAN PROCESSING OF SILICON SURFACES V, 2003, 92 : 297 - 300
  • [37] Low-K wire bonding
    Kim, Yoon-joo
    Kim, Joon-soo
    Chung, Ji-young
    Na, Seok-ho
    Kim, Jin-young
    Kim, Seok-bong
    56TH ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE 2006, VOL 1 AND 2, PROCEEDINGS, 2006, : 1616 - +
  • [38] Low-k 'summit' convenes
    不详
    MICRO, 2002, 20 (02): : 15 - 15
  • [39] Low-k integration issues
    Hsueh, G
    SOLID STATE TECHNOLOGY, 2001, 44 (01) : 78 - 78
  • [40] Vibrational spectroscopy of low-k/ultra-low-k dielectric materials on patterned wafers
    Lam, Jeffrey C. K.
    Huang, Maggie Y. M.
    Tan, Hao
    Mo, Zhiqiang
    Mai, Zhihong
    Wong, Choun Pei
    Sun, Handong
    Shen, Zexiang
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2011, 29 (05):