Origin of intense yellow-light emission from amorphous silicon oxynitride thin films prepared by dual ion beam sputtering

被引：0
|
作者：
Qu, Fa-Jun [1 ,2 ]
Xu, Hua [1 ,2 ]
Wu, Xue-Mei [1 ,2 ]
Zhuge, Lan-Jian [3 ]
机构：
[1] Department of Physics, Suzhou University, Suzhou 215006, China
[2] Ion Beam Laboratory, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Science, Shanghai 200050, China
[3] Testing and Analysis Centre, Suzhou University, Suzhou 215006, China
来源：
Gongneng Cailiao/Journal of Functional Materials | 2006年 / 37卷 / 03期
关键词：
Amorphous films;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：492 / 495
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