Terahertz metal bi-grating fabrication using ultra-thick photoresist process

被引：0
|
作者：
Shan, Yunchong [1 ,2 ,3 ]
Ruan, Jiufu [1 ,2 ]
Yang, Jun [1 ,2 ]
Deng, Guangsheng [1 ,2 ]
Lü, Guoqiang [1 ,2 ]
机构：
[1] Key Laboratory of Special Display Technology(Hefei University of Technology), Ministry of Education, Hefei 230009, China
[2] Academy of Photoelectric Technology, Hefei University of Technology, Hefei 230009, China
[3] School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei 230009, China
来源：
Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2014年 / 26卷 / 05期
关键词：
Aspect ratio;
D O I：
10.11884/HPLPB201426.053102
中图分类号：
学科分类号：
摘要：
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